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Artigos • Matéria (Rio J.) 24 (1) • 2019 • https://doi.org/10.1590/S1517-707620190001.0648   copy

Comparative analysis of electrical properties of single and multilayers of VOx deposited by RF magnetron sputtering for bolometers application

Authorship SCIMAGO INSTITUTIONS RANKINGS

ABSTRACT

VOX thin films (single and multilayers) were fabricated by RF magnetron sputtering for application in bolometers. The samples were deposited without vacuum break from three targets: V2O3; VO2 and V2O5. A RF magnetron sputtering system with three cathodes was built to carry out the depositions. The results showed that both configurations, single layers and multilayers, presented similar values of TCR, roughly 2%/K, and sheet resistance less than 20 kΩ/sq, being recommended for application in bolometers.

Keywords
VOX; RF magnetron sputtering; bolometric detectors

Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiro, em cooperação com a Associação Brasileira do Hidrogênio, ABH2 Av. Moniz Aragão, 207, 21941-594, Rio de Janeiro, RJ, Brasil, Tel: +55 (21) 3938-8791 - Rio de Janeiro - RJ - Brazil
E-mail: revmateria@gmail.com
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