The use of the quartz crystal microbalance process, electrochemical impedance spectroscopy and surface plasmon resonance for characterizing thin films and monitoring interfaces is presented. The theorical aspects of QCM, EIS and SPR are introduced and the main application areas are outlined. Future prospects of the combined applications of QCM, EIS and SPR methods in the studies of interfacial processes at surfaces are also discussed.
QCM; EIS; SPR
